微專業(yè)---半導(dǎo)體制造技術(shù)課程：半導(dǎo)體工程專業(yè)英語(yǔ)ContentsSemiconductorProperties半導(dǎo)體特性01SemiconductorMaterials半導(dǎo)體材料02SemiconductorDeviceandHowTheyareUsed半導(dǎo)體器件及其使用03ProcessTechnology工藝技術(shù)04FabricationProcesses制造工藝05SemiconductorMaterialsandProcessCharacterization半導(dǎo)體材料與工藝表征06ProcessTechnology4.1SubstratesfromtheProcessPerspective4.2Liquid-Phase(Wet)Processes4.3Gas-Phase(Dry)Processes4.4ProcessesinSemiconductorManufacturing4.5ContaminationControl4.6ProcessIntegration0415Introduction

Incontrasttowetprocesseswhichrelyentirelyonthechemicalreactions

withtheprocessedmaterial,dryprocessesallowalsophysicalinteractionsbetweenspeciesinthegas-phaseandprocessedmaterial.Suchgaseousspecies

canbeelectricallychargedandcancarrysignificantamountofkineticenergy

bothofwhichcanbeusedtoenforcedirectionality(anisotropy)ofgaseous

ambientinteractionswithprocessedmaterial.Byrelyingsolelyonthechemicalreactions,wetprocessesarebydefinitionhighlyisotropic.Thisisone

differenceinbasiccharacteristicsofwetanddryprocesseswhichmakesthe

lattermorebroadlyusedinsemiconductormanufacturing./??n??sɑ?tr?pi/各向異性4.3Gas-Phase(Dry)Processes4ProcessTechnology/?ɡ?si?s/氣態(tài)的/d??rek???n?l?ti/定向性/??mbi?nt/環(huán)境/?so?lli/單獨(dú)地/k??net?k/動(dòng)/?a?s??trɑ?p?k/各向同性的16

Gasesusedinsemiconductortechnologyareconsideredintermsofinertgaseswhichundernormalconditionsdonotengage

inanychemicalreactions,andprocessgases,alsoreferredtoasspecialty

gases,whichinteractchemicallywithothergasesorwithsolidswhichare

exposedtothem./?spe??lti/特殊4.3Gas-Phase(Dry)Processes4ProcessTechnology/??n??rt/惰性的4.3.1

GasesText17

Vacuuminfrastructureprovidesanenvironmentespeciallyconducivewith

theneedsofsemiconductormanufacturingwherepurityoftheambientandprecisecontrolovervariousprocessparametersareofparamountimportance.Inaddition,vacuumisneededtoinitiateadischargeingasesleadingtothegenerationofplasmawhichcreatesunique,andindispensableinsemiconductormanufacturing,processenvironment.Consideringallthis,itisevidentthatthevacuumequipmentisubiquitousinsemiconductormanufacturinginfrastructure,aswellasinanysemiconductorrelatedresearchanddevelopmentendeavor./?p?r?ma?nt/至為重要的4.3Gas-Phase(Dry)Processes4ProcessTechnology/??nfr?str?kt??r/設(shè)施/??mbi?nt/環(huán)境4.3.2

VacuumText/??nd??spens?b(?)l/不可或缺的/ju??b?kw?t?s/無(wú)所不在的/?n?dev?r/努力做的事/d?s?t?ɑ?rd?/放電18In-classexercisConnecttheEnglishwords/phrasesandChinesemeaningwithlines.cleanroomdeionizedwaterelectronbeamflexibledisplayparticleminienvironmentwaferprocesswatermarksvacuumactivationenergy柔性顯示器潔凈室微粒電子束晶圓工藝活化能水痕真空微環(huán)境去離子水4ProcessTechnology19In-classexercisFillintheblankswithproperwordsorphrases.1.Thesubstratewafersinsemiconductortechnologyaregettinglargerin

ordertoincreasethenumberofdevicesbuiltintothewaferandinconsequenceto

thecostofelectronic/photonicfunctionsperformedby

devicesbuiltintothewafer.

2.

consumptionperwaferexceeds

byafactorofatleastthreeconsumptionsofenergy,elementalgases,and

specialtychemicalscombined.4ProcessTechnology20單詞/短語(yǔ)音標(biāo)中文含義absorptioncoefficient/?b?s??rp?(?)n?ko???f??(?)nt

/吸收系數(shù)ACplasma/?pl?zm?/交流等離子體activationenergy/??kt??ve??n?en?rd?i

/活化能ballroomcleanroom/?b??lru?m

/舞廳式潔凈室batchprocess/b?t??prɑ?ses/批量工藝bay/chasecleanroom/be?

/t?e?s/港灣/通道式潔凈室capacitivecoupling/k??p?s?t?v?k?pl??

/電容耦合Chemical-MechanicalPolishing/Planarization(CMP)/pl?n?ra?'ze??n

/化學(xué)機(jī)械拋光/平坦化cleanroom/?kli?nru?m

/潔凈室KeyTerms4ProcessTechnology21單詞/短語(yǔ)音標(biāo)中文含義cleanroomclass/kl?s/潔凈室等級(jí)clustertool/?kl?st?r/集群工具deepUV/di?p/深紫外光deionized(DI)water/di?a???na?zd/去離子水downstreamplasma/?da?n?stri?m/順流等離子體electronbeam(e-beam)/??lektrɑ?nbi?m/電子束electronbeam(e-beam)heating/?hi?t??/電子束加熱ElectronCyclotronPlasma(ECRplasma)/?sa?kl?trɑ?n/電子回旋等離子體excimerlaser/?eks?m?r?le?z?r/準(zhǔn)分子激光器4ProcessTechnology22單詞/短語(yǔ)音標(biāo)中文含義extremeUV/?k?stri?m/極紫外光flexibledisplay/?fleks?b(?)ld??sple?/柔性顯示器flexibleelectroniccircuit/??lek?trɑ?n?k?s??rk?t/柔性電子電路focusedionbeam(FIB)/?fo?k?st?a??n?

bi?m/聚焦離子束glowdischarge/ɡlo?d?s?t?ɑ?rd?/輝光放電heliconplasma/?hel??kɑn/螺旋等離子體HEPA(HighEfficiencyParticulateAir)/pɑ?r?t?kj?l?t/高效微粒空氣highdensityplasma(HDP)/?dens?ti/高密度等離子體high-thermalbudgetprocess/?b?d??t/高熱預(yù)算工藝high-vacuumpump/?v?kju?mp?mp/高真空泵implantation/??mpl?n?te??n/注入4ProcessTechnology23單詞/短語(yǔ)音標(biāo)中文含義inductivecoupling/?n?d?kt?v?k?pl??/電感耦合inductiveheating/?n?d?kt?v?hi?t??/電感加熱InductivelyCoupledPlasma(ICP)/?n?d?kt?vli?k?pld?pl?zm?/電感耦合等離子體inelasticcollision/??n??l?st?kk??l??(?)n/非彈性碰撞isopropylalcohol(IPA)drying/?a?s??pro?p?l??lk?h??l/異丙醇干燥laminarflow/?l?m?n?r/層流laserbeamheating/?le?z?rbi?m?hi?t??/激光束加熱localheating/?lo?k(?)l?hi?t??/局部加熱low-thermalbudgetprocess/?b?d??t/低熱預(yù)算工藝manufacturingthroughput/?m?nju?f?kt??r??

?θru?p?t/制造產(chǎn)量

manufacturingyield/ji?ld/制造成品率4ProcessTechnology24單詞/短語(yǔ)音標(biāo)中文含義Marangonidrying/?dra???/Marangoni干燥metalliccontaminant/m??t?l?kk?n?t?m?n?nt

/金屬污染microwaveplasma/?ma?kr?we?v/微波等離子體minienvironment/?m?ni/微環(huán)境organiccontaminant/??r?ɡ?n?kk?n?t?m?n?nt

/有機(jī)污染物ozonatedwater/?o?zo?ne?t?d/臭氧水parallel-platereactor/?p?r?lelple?tri??kt?r/平行板反應(yīng)器partiallyionizedgas/?pɑ?r??li?a??na?zdɡ?s/部分電離氣體particle/?pɑ?rt?k(?)l/微粒photochemicalreaction/?fo?to??kem?klri??k?(?)n/光化學(xué)反應(yīng)photolithography/?fo?to?l??θɑ?ɡr?fi/光刻4ProcessTechnology25單詞/短語(yǔ)音標(biāo)中文含義photolysis/fo??tɑ?l?s?s/光解planarization/pl?n?ra?'ze??n/平坦化plasma/?pl?zm?/等離子體plasmaafterglow/??ft?rɡlo?/等離子體余輝plasmadensity/?dens?ti/等離子體密度plasmaenhanced(PE)process/?n?h?nst/等離子體增強(qiáng)工藝point-of-usechemicalgenerationpyrolysis/pa??rɑ?l?s?s/原位(使用點(diǎn))品生成熱解radiantheating/?re?di?nt/輻射加熱rapidthermalprocessor(RTP)/?r?p?d/快速熱處理器remoteplasma/r??mo?t?pl?zm?/遠(yuǎn)程等離子體ResidualGasAnalyzer(RGA)/r??z?d?u?l/殘余氣體分析儀4ProcessTechnology26單詞/短語(yǔ)音標(biāo)中文含義resistanceheatedfurnace/?f??rn?s/電阻加熱爐RFPlasma/?pl?zm?/射頻等離子體roll-to-roll(R2R)process/ro?l/卷對(duì)卷工藝secondaryelectron/?sek?nderi/二次電子showeredionbeam(SIB)/??a??rd/簇射離子束singl